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ELECTRONIC DEVICE FAILURE ANALYSIS | VOLUME 19 NO. 1

confirmed the flatness of the surface and its suitability

for nanoprobing because of slightly raised metal/via and

transistor contacts over the insulator/dielectric layers.

Mr. Christian Catalan of Rasterly Lab was the last

speaker. He discussed the importance of and the chal-

lenges facing failure analysis and probing engineers in

data management and analysis for nanoprobing. He

shared his thoughts onwhat makes an effectiveworkflow

as well as useful data summary charts. He demonstrated

an advanced data analysis platform that addressesmany

of theaforementioned issues. It is aweb-basedapplication

that caters to collaborative teams, reduces the depen-

dency on scripting solutions such as Excel, and introduces

advanced capabilities such as saved sessions, searchable

analyses, and effortless collaboration with colleagues.

In the broader scope, this is a call for standards in data

analysis, so that workflow can be universal and highly

accessible to nanoprobing users.

ISTFA 2016 CONTACTLESS FAULT ISOLATION

USER GROUP

Moderators: Patrick Pardy and Dan Bockelman, Intel Corporation

patrick.pardy@intel.com dan.bockelman@intel.com

O

ver the past few years, the Contactless Fault

Isolation User Group has looked for innovations

and research on how to move the capabilities

forward for future process geometrical scaling. Some

presentations were given in topic areas such as higher-

numerical-aperture lenses, shorter wavelength usage,

and so on. Although these developments will be very

important moving forward, we continue to use a very

large industry-installed base of current technologies to

perform failure analysis and debug of our products. This

large number of tools represents a huge capital outlay

for many companies, so the use of them for an extended

period of time continues to be imperative. Therefore, this

year’s focus for the Contactless Fault IsolationUser Group

centeredonboth innovation and efficiency for the existing

industry standard infrared-based optical probe toolset.

We want to “wring” every cent of value that we can from

these tools until the next inflection point is reached due

to fab process and where the future of the industry leads.

Dr. Krishna Kuchibhotla of Checkpoint Technologies

gave the presentation “Unique Dual-Beam Interferometer

for Probing ICs.” This new IC-probing technology show-

cases a dual adjustable laser beam using phase-shift

interferometry. The new hardware splits the incident

beam into probe and reference beams, which can be

moved independently of each other. A phase shift inter-

ferometer splits the beam into two separate beams, with

a phase difference that can be adjusted between 0 and

2

p

. Precision phase control allows the operator to obtain

a good fringe contrast, which provides improved signal

detection. The operator can use the probe beam for

probing and park the reference beam anywhere within

the permissible piezo field of view. The hardware also

provides shutter capabilities to shut off one of the beams.

The tool name is SOM-DBI, for laser scanning optical

microscopewith integrated dual-beam interferometer. An

upgrade option for the DBI is available for existing tools.

The new capability uses the same software but adds a

newgraphical user interfacewindowwith a second beam

(green color) that can be moved around independently

from the existing beam (red color). Either unseparated

or separated dual-beam modes can be used, but the

separated mode offers an improved signal. An example

was shown that illustrated howusing unseparated versus

single mode gave a

+

3 db signal improvement. Another

example showed that for a small node, the aligned dual-

beamconfiguration provided

+

1.7 db improvement when

compared to using a single-beam configuration only. In

summary, this is a unique method of DBI with adjustable

x

,

y

, and

z

flexibility for the two beams.

Mr.Neel Leslieof FEI/ThermoFisher ScientificCompany

gave the second presentation, “Advanced CW Laser

Voltage Probe Technique: Imaging Non-Periodic Signals.”

Anew technique, known as laser voltage tracing (LVT), was

presented. This technique adds a gated integrator to get

past any limitations of the spectrum analyzer. The test

loop frequency and number of averages determine the

hardware bandwidth. Subtraction is done between the

gate and gated signal, and the result is digitized by the

laser scanning microscope. When anomalies occur, the