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ELECTRONIC DEVICE FAILURE ANALYSIS | VOLUME 19 NO. 2

24

increase reconstruction accuracy (e.g., inputting a mea-

sured shank angle fromhigh-resolution scanning electron

microscope, or SEM, images; measurements of tip diam-

eter at specific features). Once an accurate reconstruction

is achieved, the sample is ready for 3-D analysis.

CASE STUDY: EPITAXIAL SiGe PROFILE

AND DOPANT DISTRIBUTION FOR

SOURCE/DRAIN FinFET DEVICE

The complex 3-D structure of state-of-the-art FinFETs,

as shown in the schematic in Fig. 3, presents challenges

for a number of characterization techniques. This study

examines the use of 3-D APT to reveal structural and com-

positional characteristics of the SiGe source/drain region

of the FinFET as well as light dopant profiles throughout

the SiGe. The structure examined in this study consists of a

specially designed array of fins andpolysilicon (“dummy”)

gates, each with known pitch and length on the order of

microns. Sample preparation was done following the

cross-section preparation method demonstrated in Ref

1, which involves rotating the lamella 90° after liftout,

such that the gates run parallel to the

z

-axis of the APT

tip, with rows of fins running perpendicular to the tip in

the

x

-direction, as shown in Fig. 1.

Field evaporation of the tip was done in a Cameca

FlexTAP 3-D atom probe at 50 K under ultrahigh vacuum

conditions (~3

×

10

−

11

torr) using an ultraviolet laser

with starting energy of 35 nJ (spot size ~20 µm), which

was slowly decreased throughout field evaporation as

the voltage increased to maintain a Si

++

:Si

+

ratio of

approximately 10:1. The atom probe was operated at the

maximum field of view of 30° to increase the captured

cross section of the tip. The volume indicated in Fig.

1(b) was evaporated and collected. The collected atoms

were reconstructed using the Integrated Visualization

and Analysis Software package, which reconstructs the

original tip with the capability of performing 3-D analysis

not only of the tip surface visible in the SEM but of buried

features as well.

A FIRST LOOK AT THE

RECONSTRUCTED TIP

In the reconstructed volume, each collected element,

molecule, and/or isotope (including various ionization

states) can be shown in a different color and displayed or

hidden from view as desired, to more clearly analyze dif-

ferent features. Furthermore, “cuts” can bemade into the

reconstruction at any location and orientation to reveal

buried features, concentrations of various species can be

Fig. 3

Schematic of the device structure analyzed by APT in

this study. The dashed white line shows the position

of the atom probe tip.

Fig. 4

A 3-D APT reconstruction of the tip shown from (a)

perpendicular to the fins perspective and (b) plan

view (top-down perspective). Silicon, germanium,

andthegateoxidearehighlightedbyisoconcentration

surfaces of different colors as indicated in (a). Scale

bars not shown for proprietary reasons