Table of Contents Table of Contents
Previous Page  22 / 62 Next Page
Information
Show Menu
Previous Page 22 / 62 Next Page
Page Background edfas.org

ELECTRONIC DEVICE FAILURE ANALYSIS | VOLUME 18 NO. 1

22

WIRE BONDING

Lee Levine, Process Solutions Consulting, Inc.

levilr@ptd.net

EDFAAO (2016) 1:22-28

1537-0755/$19.00 ©ASM International

®

T

he dominant process for interconnecting semicon-

ductor chips to the outside world is an ultrasonic

welding process called wire bonding. More than

90% of the chip interconnections produced annually

(more than 15 trillion wires) are produced with this

process. Welding is a process where an intermetallic

alloy is formed from thematerials to be joined. Generally,

intermetallic alloys are stronger and alsomore brittle than

their constituents. Welding is superior to other joining

methods such as soldering, which requires that a low-

melting-temperaturematerial melt and solidifywithin the

joint. Low-melting-temperaturematerials such as solders

have significantly lower strength and are more subject

to creep and fatigue failures than intermetallics. There

are two major variations of the wire bonding process:

ball bonding and wedge bonding. Ball bonding is the

larger portion, with approximately 90% of the entire wire

bonding market. The fastest ball bonders can bondmore

than 20 wires/second compared to less than 10 wires/

second for wedge bonding. Ball bonding also has more

advanced capabilities than wedge bonding. However,

ball bonding is limited to wires below approximately

50 µm indiameter. All interconnections that require larger-

diameter wire are produced bywedge bonding aluminum

or copper, using either round wire or ribbon (a flattened

form of round wire).

During the past 5 years there has been a major transi-

tion in our industry from ball bonding with gold wire to

the use of copper, palladium-coated copper, or silver wire.

This year will be the first year wheremarket share for gold

wire falls below 50%. Cost, yield, and reliability have all

played a major part in this transition. In 2009, when gold

rose in price above $1000/troy ounce and remained there,

gold reduction became a mandate in semiconductor

packaging. Gold wire represented a large portion of the

gold used in semiconductor packaging. Copper had been

discussed

[1]

and demonstrated since the early 1980s but

had not been widely adopted. Copper was more difficult

to bond and had package reliability issues. As these issues

(optimumbondpadmetallization, encapsulation chemis-

try for long-termreliability, bonder recipe improvements)

were resolved, the transition became a stampede and in 5

years became a newparadigm. Silver is also less expensive

than gold. Silver is used for bonding light-emitting diode

devices because it has better reflectivity properties than

either copper or gold. Early problems with silver wire in

85 °C/85% relative humidity testing were resolved using

silver-palladium alloy wire. Silver market share is now

approaching 10%.

Figure 1 is a photo of the bond head with capillary,

wire, and electronic flame-off (EFO) wand. Inball bonding,

the tip of a fine-diameter metallic wire (protruding from

the capillary) is melted by a spark from the EFO. Surface

tension in themetallic liquid pulls the liquid into a sphere;

the sphere solidifies, withmore than80%of theheat trans-

ferring back into thewire. This leaves a short region above

the ball, called the heat-affected zone (HAZ), that has been

rapidly heated to just below themelting temperature and

then cooled rapidly to near room temperature. The HAZ

is the weakest portion of the wire. The bond head, with

capillary and ball dangling below it, descends at high

speed toward the surface (normally the bond pad on a

die). At a programmed height above the surface, the bond

pad velocity transitions to a slower, constant velocity,

and the bonder begins searching for the surface (surface

height can vary due to the many tolerances from mate-

rial and prior operations). Surface detection can occur by

a number of methods, including mechanically opening

a contact spring, as in older machines, or high-speed

sensing of a current rise in a voice coil motor when the coil

stalls on contact. After contact detection, the bond head

continues downward to apply a programmable force on

the ball. Ultrasonic energy froma piezoelectric transducer

is added for a programmable time (8 to 12ms is typical for

a high-speed ball bonder). The die and substrate are nor-

mally heated to 125 to 200 °C, depending on the process

andmaterials. These four factors—ultrasonic energy, bond

force, heat, and time—constitute the principal variables

for ultrasonic weld formation.

After completing the ball bond cycle, the bond head

rises and a series of very precise coordinated motions

occur, forming a loop between the ball bond and the

second bond. Loop height and uniformity are very