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ELECTRONIC DEVICE FAILURE ANALYSIS | VOLUME 18 NO. 1

S - 1

A SUMMARY OF THE ISTFA 2015 PANEL DISCUSSION:

FIRST-SILICON DEBUG

Felix Beaudoin

Globalfoundries, Malta, NY

felix.beaudoin@globalfoundries.com

EDFAAO (2016) 1:S1-S8

1537-0755/$19.00 ©ASM International

®

T

he ISTFA 2015 Panel Discussion was dedicated to

the challenge of performing failure analysis (FA)

and debug of first-silicon products. Time-to-market

of new products is critical, and product systematic failure

can result in months of delay. High pressure is on the FA

laboratory, which is expected to find root cause in days, if

not hours. The panel presentations discussedmethodolo-

gies for performing first-silicon debug and the importance

of setting up the right culture and environment for success.

The panel members were Ryan Ross of NASA Jet

Propulsion Laboratory, Pasadena, Calif.; Geir Eide of

Mentor Graphics, Wilsonville, Ore.; Izak Kapilevich of DCG,

Chandler, Ariz.; and Joe Lebowitz of Maxim. The panel was

moderated by Tracy Myers, ON

Semiconductor, Gresham, Ore.

The panel opened with a

presentation by Ryan Ross on

the complex task of planning for

new product introduction (NPI)

to enable successful first-silicon

debug. He argued that ultrafast

NPI issue identification is a high-

visibility opportunity to shine or

fail. Ryan highlighted that an FA

plan must be started 6 months prior to a new product and

should include deliverables such as layout, test conditions

and test program, automatic test pattern generator diag-

nostic package,memory logical tophysical translation, and

probe card and load board to enable dynamic FA. Planning

should start approximately 18 months in advance if new

tooling, process flow, andprocedures are required to tackle

future FA challenges on upcoming technologies.

Geir Eide then focused on the test perspective of first-

silicon debug. He stated that effective and automated

diagnosis of a test failure requires an accurate model of

the actual fail mechanism. However, design marginalities,

which are often involved in new product failures, are hard

to model. Geir presented two trends that further increase

the diagnosis challenge: the introduction of more complex

design-for-test structures, and the growing number and

complexity of on-chip instruments. On the bright side, he

presented the IEEE1687 IJTAGstandard that enables access

to any component within a system-on-chipwithout a priori

knowledge through instrument-specific instructions.

Izak Kapilevich followed with an introduction on the

FA organization and described the FA process flow used

to identify failure root cause. He argued that when a new

device is introducedwith a newproblem, the FA labwill typ-

ically try all static anddynamic optical-based techniques to

localize the failure to a smaller area of interest to improve

the physical FA success rate. He also emphasized the impor-

tance of wafer-level testing to

perform quick die-to-die analy-

sis to improve turnaround times.

Izak presented a comparison

between three companies and

correlated their respective first-

silicon debug time to root cause

to their level of FA readiness.

Joe Lebowitz concluded the

panel presentations with five

examples that illustrated the critical importance of test and

FA for first-silicon debug. In his opinion, the fab ultimately

owns the yield issue even if the root cause can be design,

test, or FA. The first case study he presented highlighted a

yield loss due to a frequency shift on amulticore processor

that was ultimately traced back to a test sequence change

to improve test time. Thedie-heatingdifferences shifted the

measured F

max

. The corrective action was to put in place a

change control for all changes, including test. In another

example, Joe discusseda 0 kmautomotive customer return

that failed for missing-metal defects. Root-cause analysis

identified that, due to incomplete test coverage, the fab

defects could not be screened in the specific failing block.

Containment actionwas to implement 100% in-line defect

scans of specific care area at allmetal layers. Joe concluded

“THE PANEL PRESENTATIONS

DISCUSSED METHODOLOGIES

FOR PERFORMING FIRST-SILICON

DEBUG AND THE IMPORTANCE OF

SETTING UP THE RIGHT CULTURE AND

ENVIRONMENT FOR SUCCESS. ”