Previous Page  48 / 66 Next Page
Information
Show Menu
Previous Page 48 / 66 Next Page
Page Background

edfas.org

ELECTRONIC DEVICE FAILURE ANALYSIS | VOLUME 18 NO. 4

48

PRODUCT NEWS

Larry Wagner, LWSN Consulting Inc.

lwagner10@verizon.net

PRESS RELEASE SUBMISSIONS:

MAGAZINES@ASMINTERNATIONAL.ORG

PARK SYSTEMS LAUNCHES RESEARCH

AFM

Park Systems (Suwon, Korea) launched Park NX20

300 mm, the first and only research atomic force micro-

scope (AFM) on themarket capable of scanning the entire

sample area of 300 mm wafers using a 300 mm vacuum

chuck while keeping the system noise level below 0.5 Å

root mean square.

The Park NX20 300 mm system is run by SmartScan,

Park’s new operating software with automatic scan

control, and it comes with “batch mode” functionality,

where the users can perform a recipe-automated, unlim-

ited number of sequential multiple-site measurements

over the 300

×

300 mm area. The automated measure-

ments over a 300 mm wafer dramatically improve user

convenience and productivity in the industrial lab setting,

where comparisons within site-to-site and sample-to-

sample surface morphologies (height, surface roughness

measurements) are extremely important.

“Today, large samples of up to 300mmwafers and sub-

strates are widely used for process development, failure

analysis, and production, but so far there has not been an

AFM measurement tool that can accurately measure the

full area in one load and easily program it to takemultiple-

sitemeasurements in one click,” commentedKeibock Lee,

Park Systems’ President. “ParkNX20 300mmaccesses the

entire 300 mm wafer in a single loading with low-noise

AFM measurements, which opens up a whole new scope

of measurement automation on a 300 mm wafer.”

Park NX20 300 mm enables AFM inspection and scans

over the entire sample area of 300 mm wafers by using

a full 300

×

300 mm motorized

XY

stage, so the system

can access any location on a 300 mm wafer. Unlike other

products currently on the market, Park’s NX20 300 mm

is the only product that can hold a 300 mm sample. For

example, the competitor’s system that comes closest

to Park’s is combined with a 300 mm sample chuck but

requires the user to load nine times to access the entire

300 mm wafer area, because the range of the motorized

XY

stage is limited to 180

×

220 mm.

ParkNX20 300mmstandard vacuumchuck is designed

to hold samples ranging in size from 300 to 100 mm and

can even support small coupon samples of arbitrary

shapes, using a vacuum hole. Products currently on the

market are limited to 200 mm sample sizes and must

rely on cutting up the sample to maintain the low noise

required by industry, which is cumbersome and makes

sharing the AFM a challenge. The new Park NX20 is the

perfect solution for shared labs whose samples come in

various sizes—small and large—because it supports from

large to small coupon samples and is compatible with all

the modes and options available to Park’s other research

AFM products.

For more information: web: parkafm.com; tel:

408.986.1110.

TERAVIEW INTRODUCES IC PACKAGE-

INSPECTION SYSTEM

TeraView (San Francisco, Calif.), the pioneer and

leader in terahertz technology and solutions, introduced

the EOTPR 5000, a fully automated integrated circuit (IC)

package-inspection system. Building on the success of the

EOTPR 2000, which has an established track record in the

industry for rapid fault isolation and manual inspection,

the EOTPR 5000 is a fully automated advanced IC pack-

age-inspection system that uses TeraView’s proprietary

electro-optical terahertz pulse reflectometry (EOTPR)

technology to detect weak or marginal interconnect

quality in high-volume manufacturing environments,

whichno other technology can currently detect.

Today’s advanced IC packages are susceptible to a

variety of faults and quality variations, including solder

ball defects such as head-in-pillow failures in package-

on-package or 2.5-/3-Dpackages. Theseweak ormarginal

interconnect conditions may not be captured by logic or

electrical testers even if there is good electrical continuity

present. However, due to the EOTPR 5000’s superior accu-

racy and sensitivity, users can nowdetect minute shifts in

impedance changes fromweak ormarginal interconnects

after accelerated life tests or high-temperature cycle tests.

The same principle applies to the detection and reduction

ofmanufacturing variations to improve packaging-related

(continued on page 50)