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57 ADVANCED MATERIALS & PROCESSES • AUGUST 2014
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Advanced Materials & Technology Services Inc. 42
Christian Bürkert GmbH & Co. KG 7, 38
DeWAL Industries Inc. 44
Epsilon Technology Corp. 58
Guyson Corp. 35
Master Bond Inc. 25
NSL Analytical Services Inc. IFC, 3
Oerlikon Metco 45
Progressive Surface 36
Saint-Gobain Coating Solutions 32
Struers Inc. BC
Surface Modification Systems Inc. 42
Westmoreland Mechanical Testing & Research Inc. 58
classifieds
erating temperature of -65° to 250°F, and is temperature
compensated from 60° to 160°F. .
Park Systems, Korea, announces Park NX-Wafer, a revolution-
ary atomic force microscopy (AFM) design for bare wafer
manufacturing that fully automates the defect review process
and increases production throughput by 1000%. The micro-
scope produces sub-Angstrom roughness measurements for
the flattest substrates and wafers with tip-to-tip variation of
less than 2%. The device also features a long range sliding
stage that combines with NX-Wafer to become an atomic
force profiler (AFP). The new low noise AFP provides very flat
profiling to 50 mmwith profiling speed as fast as 1 mm/sec for
both local and global uniformity measurements including dish-
ing, erosion, and edge-over-erosion (EOE) after chemical me-
chanical polishing (CMP). .
SiVance LLC, Spartanburg, S.C., a subsidiary of Milliken &
Co., released SiVance C1008 Curative, a new silicone cur-
ative that significantly improves the durable flexibility of
epoxy polysiloxane protective topcoats in marine and infra-
structure applications, without sacrificing weatherability. This
development solves a major challenge common to epoxy
polysiloxanes—brittleness and cracking that can develop
over time as the coating cures. The product is fully miscible
with hydrogenated bisphenol-A epoxy resins. Compatibiliza-
tion of C1008 Curative in other epoxy resins is possible with
the use of solvents (methyl ethyl ketone (MEK), xylenes, etc.)
or reactive diluents.
ZEISS, Germany, introduces its latest photomask qualifica-
tion system, the AIMS 1x-193i. The new system supports the
further extension of 193-nm lithography and meets the chal-
lenging requirements of advanced lithography techniques
such as multi-patterning and source mask optimization. It also
enables users to qualify the optical performance of a mask
under scanner equivalent illumination condi-
tions. The AIMS 1x-193i works with 193-nm
illumination and benefits from a completely
redesigned optical system. Another highlight
is a significantly improved CD repeatability
enabling more accurate defect qualification
that stays ahead of the requirements of the
ITRS roadmap as the industry move to
smaller feature sizes.
The NanoSteel Co., Providence, R.I., announces a portfolio
of ferrous powders designed to extend steel’s capabilities
in near-net shape wear parts for highly abrasive environ-
ments. These new alloys feature hardness in excess of 1400
HV, wear resistances well below 10 mm3 volume loss (ASTM
G-65), and spherical morphology that results in excellent
packing factors and flowability important for producing
high-density parts under tight dimensional control. This
family of new powders enables production of extreme hard-
ness wear parts through a wide variety of consolidation
processes, including additive manufacturing, without the
need for subsequent heat treatment. .