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A D V A N C E D
M A T E R I A L S
&
P R O C E S S E S |
S E P T E M B E R
2 0 1 5
3 1
TABLE 3—RELATIVE INTENSITIES OF TA 4F OXIDE AND REDUCED
COMPONENTS BEFORE AND AFTER SPUTTER-CLEANING
Cleaning method Ta 4f oxide Ta 4f reduced
None 100 -
Cluster ions 100 -
200eV monatomic 70.4 29.6
TABLE 2—ATOMIC CONCENTRATIONS BEFORE
AND AFTER CLUSTER-CLEANING
Name As-received
atomic %
After cluster
cleaning atomic %
C 50.7 0
O 33.7 71.8
Ta 11.8 28.2
Si 3.8 0
Fig. 4 — Comparison of Ta 4f spectra for monatomic Ar+ and
argon cluster ion sputter-cleaning of Ta2O5.
Fig. 3 — Comparison of XPS survey spectra before and after argon cluster
ion cleaning.