edfas.org ELECTRONIC DEV ICE FA I LURE ANALYSIS | VOLUME 24 NO . 4 56 capacitance at 0.075 aF combined with deep-nanoscale lateral resolution can image doping levels from intrinsic silicon to 1E20 a/cm3 levels. For more information, visit primenanoinc.com. SENSITIVE PHOTO EMISSION MICROSCOPE FOR FA IR Labs presents the IREM-IV photon emission microscope with a host of key features, making it one of the most sensitive photon emission FA tools available. At its core, the IREM-IV camera provides ultra-low noise extendedwavelength PEM imaging, with proven emission imaging sensitivity on 10 nmdevices operating at 400mV. IR Labs designs and builds their own cameras for lowmaintenance operation with superior features including a six-position lens turret and LN2 hold time longer than 20 hours. An optical expansion port provides an upgrade path for external laser scanning OBIRCH, LADA, TIVA, and other imaging modes. The 3.3NA SIL objective is the latest in the family of custom designed lenses optimized to provide superior, diffraction-limited imaging over the entire field-of-view. The patented self-aligning SIL tip automatically levels to conform to the local contour of the device under test. The unique tip flexure design provides the lowest contact force in the industry, so it is suitable for imagingmounted devices or bare wafers. The integrated profile sensor measures device surface contour with height resolution better than 10 µm. Localized surface tilting fromturned-downedges or device bowing can be directlymeasured and compensated using PRODUCT NEWS Ted Kolasa, Northrop Grumman ted.kolasa@gmail.com PRESS RELEASE SUBMISSIONS: MAGAZINES@ASMINTERNATIONAL.ORG QUANTIFIED ELECTRICAL MATERIAL PROPERTY IMAGES FOR FA AND PROCESS MONITORING PrimeNano announces the launch of ScanWave Pro Solutions, a first ever automatedproduct toperformquantified electrical propertymeasurements on the nanoscale using an AFM. In this suite of solutions, the first property to be quantified is the dopant concentration in semiconductors (measured as free carriers). The next property to be quantified will be dielectric k-value of thin films. ScanWave Pro Solutions is a combination of hardware and software that automates the process of acquiring quantified scanning microwave impedance microscopy (sMIM) images. It uses ScanWave Pro as a platform and is released on multiple AFM systems from the industry’s top providers. The ScanWave system generates and delivers a microwave signal to the tip of a custom cantilever using a shieldedwaveguide and the reflected signal is collected and used to measure localized variations in the electrical properties of material with nanoscale lateral resolution. Capacitance, resistance, free carrier density and dopant polarity (nor p) can all be collected in a singlemeasurement. The unprecedented sensitivity of the system to AFM equipped with ScanWave Pro Solutions sMIM tool suite. IR Labs’ IREM-IV photon emission microscope system.
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