August_EDFA_Digital

edfas.org 53 ELECTRONIC DEVICE FAILURE ANALYSIS | VOLUME 22 NO. 3 processing, anti-spoofing algorithms, 3D facial rec- ognition algorithms, and video encoding on a single chip, significantly reducing system complexity while improving performance. “We are delighted to partner with Lumentum and ON Semiconductor to deliver a hardware plat- form for the next genera- tion of intelligent control systems and video secu- rity devices,” says Fermi Wang, president and CEO of Ambarella. “Powered by Lumentum’s VCSEL solution, ON Semiconductor’s RGB-IR technology, and our CV25 SoC, it delivers 3D sensing with reduced system complexity as well as improved reliability and security. We look forward to seeing the innovative products our customerswill build with this hardware platform.” Ambarella’s CV25 chip includes a powerful ISP, native support for RGB-IR color filter arrays, and advanced high dynamic range (HDR) processing, which results in exceptional image quality in low-light and high-contrast environments. CV25’s CVflow architecture delivers the computational power required for liveness detection and 3D facial recognition, while runningmultiple AI algorithms for advanced features such as people counting and anti- tailgating. CV25 includes a suite of advanced security features to protect against hacking including secure boot, TrustZone, and I/O virtualization. For more information, visit ambarella.com. UV PREP FOR SEM CLEANING TOOL All SEM sample surfaces are typically coated with a thin layer of hydrocarbon contamination due to sample preparationand/or storage. This contaminationcan inhibit proper resolution of the sample surface, especially in a FE-SEM. The UV Prep for SEM from SPI is an easy to use system that removes this thin hydrocarbon film without affecting the sample itself. When stored in an open environment, samples will acquire contamination through the air. Unless they are handled carefully, they will also pick up contamination through handling. TheUV Prep for SEM is designed tomiti- gate or eliminate these effects. Why is it so important to remove this contamination prior to examination? Typical FE-SEM users are running at lower and lower beam ener- gies. The lower the beamenergy, themore sample surface detail is imaged. If surface contamination is not removed, the user is actually imaging the contaminants, and not the true sample surface. Often when focusing at highmagnification to perform analysis or capture images at lowermagnification, a “black box” can be formed on the sample. In many cases, this is caused by raster burn or electron beam induced deposi- tion (EBID) not of the sample, but of the hydrocarbon contaminants on the sample surface. Removing these hydrocarbons with the UV Prep prior to SEM analysis can greatly reduce the appearance of this black box effect. Many users purchase new FE-SEMs to take advantage of their unique operating abilities (high resolution imaging at very low kV). What they do not realize is that the only way to obtain the advertised resolution of themicroscope is to start with a clean sample. Even the best microscopes will produce poor images of dirty samples. The UV Prep uses a custom UV source to effectively attack andbreak uphydrocarbonbonds. At the same time, reactive species of oxygen react with these hydrocarbon bonds formingmolecules such as H 2 O, CO, and CO 2 , which are pumpedout of the chamber. The result is a surface free of hydrocarbon contamination. The built-in ozone scrub- ber also ensures that the reactive ozone is not released into the environment. Singleormultiple samples canbe runat the same time, depending on size (although it is recommended to place the entire SEMmount holder in the UV Prep for cleaning). A small diaphragmpump is used to obtain a slight vacuum in the chamber and pump off the reactive species. Typical cleaning time is 5 to 15 minutes. The UV Prep for SEM can also be used to store samples under vacuum to be kept clean for future examination. For more information, visit the 2spi.com . The Ambarella CV25S AI computer vision and image processing IC. The SPI Uv Prep Tool uses a UV source to effectively clean SEM samples.